兆竑科技有限公司

產品

Heatable Substrate Manipulators 基板加熱器

電洽

  • Tungsten, tantalum or graphite heater
  • Wafer temperatures up to 1200 °C
  • Continuous substrate rotation and
        linear travel for substrate transfer
  • Water cooled ceramic bearings for continuous rotation
  • Clean operation and high reliability
  • Substrate sizes up to 6 inch
  • Optional: integrated main shutter