兆竑科技有限公司

產品

e-Gun/e-beam 電子鎗/電子束

電洽

The high temperature material and low vapor pressure material with difficult vapor deposition by k-Cell are vapor deposited by the source of e-Gun vapor deposition. Broad lineup such as a type which can be easily added to MBE system and in which multi-vapor deposition is possible. Elimination of beam curl-Electrons impact the melt at a 90° angle providing maximum energy transfer with a minimum of energy-wasting secondary electrons. This is the result of a carefully graduated magnetic field which is stronger at the top of the crucible than at the bottom. Elimination of pole pieces-Vertically mounted magnets result in less magnetic flux leakage. This improves electron capture, and it improves efficiency. Thus, the more compact a magnetic circuit is, the smaller its source footprint. Easy filament alignment-Filaments are quickly, easily, and very accurately aligned by simply removing the emitter assembly from the vacuum system. An alignment tool is included with each gun. More efficient electron collimation-Our new design produces a better collimated beam with fewer stray electrons. Minimal filament distortion-By clamping the filament adjacent to the spiral, filament movement is held to a minimum. Electron tails-Special filament shielding prevents low energy electrons from leaving the filament environment, eliminating electron tails.